Title: Influence of Gate Geometry in Integrated MOS Varactors on Accumulation Mode for RF
Authors: E. Amselem, B. Gonzalez, J. Garcia, I. Aldea, M. Marrero, A.G. Iturri, J. del Pino, S.L. Khemchandani, and A. Hernández
Conference name: VI Conferencia de Dispositivos Electrónicos
Driven by the many applications that varactors have in RF integrated blocks, this work analyzes the influence of gate geometry (width and length) on integrated accumulation MOS varactors. For this purpose, a number of varactors have been designed and fabricated on a 0.8 ,Im CMOS standard technology. The most relevant parameters: quality factor, tuning range, and capacitance, are simulate and compared.